The International Conference “Micro- and Nanoelectronics – 2018” (ICMNE-2018) including the Extended Session “Quantum Informatics” (QI-2018) will be held in October 1-5, 2018 at the park-hotel “Ershovo”, Zvenigorod, Moscow Region, Russia. It will continue the series of the All-Russian Conferences “MNE-1999”, “MNE-2001”, "QI-2002" and the International Conferences “ICMNE-2003”, "QI-2004", “ICMNE-2005”, "QI-2005", “ICMNE-2007”, "QI-2007", “ICMNE-2009”, "QI-2009", “ICMNE-2012”, "QI-2012", “ICMNE-2014”, "QI-2014", “ICMNE-2016”, "QI-2016".
   ICMNE is a biannual event which is deducated to the physics of integrated micro- and nanoelectronic devices and related micro- and nanotechnologies. ICMNE-2018 will be focused on recent progress in that area. The Conference will include the exhibition of equipment for micro- and nanoelectronics.
    Besides in 2018, within the framework of the conference, a round table Russia-Japan will be held with the participation of leading scientists.

Scope:

Physics of micro- and nanodevices:

• Scaling challenges and opportunities for nanodevices
• Nanoscale transistors: CMOS FET, TFET, SET, molecular transistors, molecular switches, etc.
• Integrated memory devices, DRAM, ReRAM, FeRAM
• Devices with 1D and 2D channels
• Carbon micro- and nanoelectronics
• Solid state devices for THz generation and detection
• Magnetic micro- and nanostructures, spintronic devices
• Superconducting micro- and nanodevices and structures
• Devices for optoelectronics, photonics
• Sensors, micro- and nanoelectromechanical systems (MEMS, NEMS, BioMEMS)
• Device simulation and modeling

Technology and characterization of materials for micro- and nanoelectronics:

• Si, SOI, SiGe, A³B⁵, A²B⁶
• High-k dielectrics, low-k dielectrics
• Metal films for device structures
• 1D and 2D materials
• Magnetic materials, nanomagnetics
• Materials for optoelectronics and photovoltaic, metamaterials

Technologies and advanced equipment for micro- and nanoelectronics:

• Lithography: immersion, EUV, electron and ion lithography, nanoimprint
• Front-end of line (FEOL) processes in ULSI's technology
• Back-end of line (BEOL) processes in ULSI's technology
• 3D integration technologies
• Technologies for 2D materials (graphene, MoS₂, WS₂, etc.)
• Technologies for 1D structures (nanowires, nanotubes)
• Technologies for MEMS and NEMS
• Technologies for superconducting devices

Metrology:

• In situ processes monitoring and control (end-point detection, process smart sensors)
• Inspections, metrology, and characterization of micro- and nanostructures

Quantum informatics:

• Quantum computers: theory and experiments
• Quantum measurements
• Quantum algorithms
• Quantum communications